IEVref:523-05-08ID:
Language:enStatus: Standard
Term: isotropic etching
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Definition: etching process in which the etching rate does not vary with the crystallographic orientation or direction of the energy beams

Note 1 to entry: A typical isotropic etchant for silicon is HF/HNO3/CH3COOH (HNA) solution.


Publication date:2018-12
SourceIEC 62047-1:2016, 2.5.23
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